SCI, SSCI ve AHCI İndekslerine Giren Dergilerde Yayınlanan Makaleler
Incorporation Mechanism of Potassium in FAPbI3 Perovskite Solar Cell Materials
Oxygen incorporation in AlN films grown by plasma-enhanced atomic layer deposition
Enhancement in c-Si solar cells using 16 nm InN nanoparticles
Enhancement of polycrystalline silicon solar cells efficiency using indium nitride particles
A Near-Infrared Range Photodetector Based on Indium Nitride Nanocrystals Obtained Through Laser Ablation
Enhanced memory effect via quantum confinement in 16nm InN nanoparticles embedded in ZnO charge trapping layer
Thermal stability of InN epilayers grown by high pressure chemical vapor deposition
Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
Atomic layer deposition of GaN at low temperatures
The influence of N-2/H-2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
Optical properties of InN grown on templates with controlled surface polarities
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE
, cilt.207, sa.10, ss.2351-2354, 2010 (SCI-Expanded)


The influence of the group V/III molar precursor ratio on the structural properties of InGaN layers grown by HPCVD
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE
, cilt.207, sa.6, ss.1379-1382, 2010 (SCI-Expanded)


Optical characterization of InN layers grown by high-pressure chemical vapor deposition
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
, cilt.26, sa.4, ss.1023-1026, 2008 (SCI-Expanded)


Surface structure, composition, and polarity of indium nitride grown by high-pressure chemical vapor deposition
The characterization of InN growth under high-pressure CVD conditions
PHYSICA STATUS SOLIDI B-BASIC SOLID STATE PHYSICS
, cilt.242, sa.15, ss.2985-2994, 2005 (SCI-Expanded)


Hakemli Bilimsel Toplantılarda Yayımlanmış Bildiriler
THE ROLE OF THICKNESS ON INFRARED OPTICAL PROPERTIES OF GALLIUM NITRIDE THIN FILMS GROWN BY HOLLOW CATHODE PLASMA ASSITED ATOMIC LAYER DEPOSITION
Turkisk Physical Society 32nd International Physics Congress, Bodrum, Türkiye, 6 - 09 Eylül 2016
Infrared dielectric functions phonon modes and band gap properties of plasma assisted ALD grown InxGa1 xN films
The 16th International Conference on Atomic Layer Deposition, Dublin, İrlanda, 24 - 27 Temmuz 2016
The Role of Film Thickness on the Visible UV and Infrared Optical Properties of GaN Films Grown By Hollow Cathode Plasma Assisted Atomic Layer Deposition
The 16th International Conference on Atomic Layer Deposition, Dublin, İrlanda, 24 - 27 Temmuz 2016
Influence of N2 H2 and N2 Plasma on Binary III Nitride Films Prepared by Hollow Cathode Plasma Assisted Atomic Layer Deposition
The 16th International Conference on Atomic Layer Deposition, Dublin, İrlanda, 24 - 27 Temmuz 2016
Comparison of Trimethylgallium and Triethylgallium as Ga Source Materials for the Growth of Ultra thin GaN Films via Hollow cathode Plasma assisted ALD
American Vacuum Society, Portland, Amerika Birleşik Devletleri, 28 Haziran - 01 Temmuz 2015