Surface electron accumulation in indium nitride layers grown by high pressure chemical vapor deposition


Bhatta R., Thoms B., ALEVLİ M. , Dietz N.

SURFACE SCIENCE, cilt.601, sa.19, 2007 (SCI İndekslerine Giren Dergi) identifier identifier

Özet

Surface termination and electronic properties of InN layers grown by high pressure chemical vapor deposition have been studied by high resolution electron energy loss spectroscopy (HREELS). HREEL spectra from InN after atomic hydrogen cleaning show N-H termination with no indium overlayer or droplets and indicate that the layer is N-polar. Broad conduction band plasmon excitations are observed centered at 3400 cm(-1) in HREEL spectra with 7 eV incident electron energy which shift to 3100 cm(-1) when the incident electron energies are 25 eV or greater. The shift of the plasmon excitations to lower energy when electrons with larger penetration depths are used is due to a higher charge density on the surface compared with the bulk, that is, a surface electron accumulation. These results indicate that surface electron accumulation on InN does not require excess indium or In-In bonds. (c) 2007 Elsevier B.V. All rights reserved.