Optical characterization of InN layers grown by high-pressure chemical vapor deposition


ALEVLİ M. , ATALAY R., DURKAYA G., Weesekara A., Perera A. G. U. , Dietz N., ...Daha Fazla

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, cilt.26, ss.1023-1026, 2008 (SCI İndekslerine Giren Dergi) identifier identifier

  • Cilt numarası: 26 Konu: 4
  • Basım Tarihi: 2008
  • Doi Numarası: 10.1116/1.2908736
  • Dergi Adı: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
  • Sayfa Sayıları: ss.1023-1026

Özet

The optical properties of InN layers grown by high-pressure chemical vapor deposition have been studied. Raman, infrared reflection, and transmission spectroscopy studies have been carried out to investigate the structural and optical properties of InN films grown on sapphire and GaN/sapphire templates. Results obtained from Raman and IR reflectance measurements are used to estimate the free carrier concentrations, which were found to be varying from mid 10(18) to low 10(20) cm(-3). The values for free carrier concentrations are compared to optical absorption edge estimates obtained from optical transmission spectra analysis. The analysis shows that optical absorption edge for InN shifts below 1.1 eV as the free carrier concentration decreases to low 10(18) cm(-3). (C) 2008 American Vacuum Society.