Enhanced memory effect via quantum confinement in 16nm InN nanoparticles embedded in ZnO charge trapping layer


El-Atab N., Cimen F., Alkis S., Orta B., ALEVLİ M. , Dietz N., et al.

APPLIED PHYSICS LETTERS, cilt.104, 2014 (SCI İndekslerine Giren Dergi) identifier identifier

  • Cilt numarası: 104 Konu: 25
  • Basım Tarihi: 2014
  • Doi Numarası: 10.1063/1.4885397
  • Dergi Adı: APPLIED PHYSICS LETTERS

Özet

In this work, the fabrication of charge trapping memory cells with laser-synthesized indium-nitride nanoparticles (InN-NPs) embedded in ZnO charge trapping layer is demonstrated. Atomic layer deposited Al2O3 layers are used as tunnel and blocking oxides. The gate contacts are sputtered using a shadow mask which eliminates the need for any lithography steps. High frequency C-V-gate measurements show that a memory effect is observed, due to the charging of the InN-NPs. With a low operating voltage of 4V, the memory shows a noticeable threshold voltage (V-iota) shift of 2V, which indicates that InN-NPs act as charge trapping centers. Without InN-NPs, the observed memory hysteresis is negligible. At higher programming voltages of 10 V, a memory window of 5V is achieved and the V-iota shift direction indicates that electrons tunnel from channel to charge storage layer. (C) 2014 AIP Publishing LLC.