Electrodeposition of multilayer NiMn beams for probes

Tunaboylu B.

MATERIALS LETTERS, cilt.70, ss.51-53, 2012 (SCI İndekslerine Giren Dergi) identifier identifier

  • Yayın Türü: Makale / Tam Makale
  • Cilt numarası: 70
  • Basım Tarihi: 2012
  • Doi Numarası: 10.1016/j.matlet.2011.11.089
  • Sayfa Sayıları: ss.51-53


A method was developed for the deposition and annealing of Ni-alloy layers to obtain a low-stress film required for high cycle wafer probe applications. Ni-alloy layers with uniform compositions from 0.145 to 0.357 wt.% of Mn were electrodeposited. A high strength alloy with good ductility was produced using pulsed plating with a low internal stress level of 14 MPa. In addition, a method was developed to produce a modulated composition of Mn in Ni layers from a single bath to further improve the mechanical properties of the deposits. Multilayer NiMn layers with a composition of 0.4, 0.1, and 0.6 wt.% of Mn were produced. The microstructures showed mostly microcrystalline grains with shear band structures and finer grains with a lamellar structure were observed for higher Mn contents. (C) 2011 Elsevier B.V. All rights reserved.