Electrodeposition of multilayer NiMn beams for probes


Tunaboylu B.

MATERIALS LETTERS, vol.70, pp.51-53, 2012 (Journal Indexed in SCI) identifier identifier

  • Publication Type: Article / Article
  • Volume: 70
  • Publication Date: 2012
  • Doi Number: 10.1016/j.matlet.2011.11.089
  • Title of Journal : MATERIALS LETTERS
  • Page Numbers: pp.51-53

Abstract

A method was developed for the deposition and annealing of Ni-alloy layers to obtain a low-stress film required for high cycle wafer probe applications. Ni-alloy layers with uniform compositions from 0.145 to 0.357 wt.% of Mn were electrodeposited. A high strength alloy with good ductility was produced using pulsed plating with a low internal stress level of 14 MPa. In addition, a method was developed to produce a modulated composition of Mn in Ni layers from a single bath to further improve the mechanical properties of the deposits. Multilayer NiMn layers with a composition of 0.4, 0.1, and 0.6 wt.% of Mn were produced. The microstructures showed mostly microcrystalline grains with shear band structures and finer grains with a lamellar structure were observed for higher Mn contents. (C) 2011 Elsevier B.V. All rights reserved.