ALEVLİ, M. Et Al. 2015. Comparison of Trimethylgallium and Triethylgallium as Ga Source Materials for the Growth of Ultra thin GaN Films via Hollow cathode Plasma assisted ALD. American Vacuum Society , (Portland, United States Of America).

ALEVLİ, M., Güngör, N., Özgit Akgün, Ç., Haider, A., Kizir, S., Leghari, S., ... Alkis, S.(2015). Comparison of Trimethylgallium and Triethylgallium as Ga Source Materials for the Growth of Ultra thin GaN Films via Hollow cathode Plasma assisted ALD . American Vacuum Society, Portland, United States Of America

ALEVLİ, MUSTAFA Et Al. "Comparison of Trimethylgallium and Triethylgallium as Ga Source Materials for the Growth of Ultra thin GaN Films via Hollow cathode Plasma assisted ALD," American Vacuum Society, Portland, United States Of America, 2015

ALEVLİ, MUSTAFA Et Al. "Comparison of Trimethylgallium and Triethylgallium as Ga Source Materials for the Growth of Ultra thin GaN Films via Hollow cathode Plasma assisted ALD." American Vacuum Society , Portland, United States Of America, 2015

ALEVLİ, M. Et Al. (2015) . "Comparison of Trimethylgallium and Triethylgallium as Ga Source Materials for the Growth of Ultra thin GaN Films via Hollow cathode Plasma assisted ALD." American Vacuum Society , Portland, United States Of America.

@conferencepaper{conferencepaper, author={MUSTAFA ALEVLİ Et Al. }, title={Comparison of Trimethylgallium and Triethylgallium as Ga Source Materials for the Growth of Ultra thin GaN Films via Hollow cathode Plasma assisted ALD}, congress name={American Vacuum Society}, city={Portland}, country={United States Of America}, year={2015}}